Abstract: The paper proposes solutions for the future scaling of tunnel and interpoly dielectrics (IPD) in flash memories based on high-k materials. The concept of engineered barriers is reviewed as ...
SUBSCRIBE HERE: <a href=" JUST RELEASED! Halloween Homemade Ice Cream: <a href=" Hi Bold Bakers! You can make Zombie Cookies, ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback